Paul Eide

Title: The Innovations of Paul Eide

Introduction

Paul Eide is a notable inventor based in Stratham, NH (US), recognized for his contributions to the field of ion implantation technology. With a total of 7 patents to his name, Eide has made significant advancements that have impacted various industries.

Latest Patents

Among his latest patents is the "Ion implant apparatus and a method of implanting ions." This innovative apparatus utilizes a drum-type scan wheel that holds wafers with a total cone angle of less than 60°. A collimated scanned beam of ions, such as hydrogen, is directed along a final beam path at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy exceeding 500 keV before scanning or mass analysis. Additionally, the mass analyzer may be positioned near the axis of rotation, with unwanted ions directed to an annular beam dump mounted on the scan wheel.

Another significant patent is the "D.C. charged particle accelerator and a method of accelerating charged particles." This device comprises accelerator electrodes separated by insulating spacers that define acceleration gaps between adjacent pairs of electrodes. Individually regulated gap voltages are applied across each adjacent pair of accelerator electrodes. In one embodiment, direct connections are provided to gap electrodes from the stage points of a multistage Cockcroft Walton type voltage multiplier circuit. This design enables an ion beam to be accelerated to high energies and high beam currents while maintaining good accelerator stability.

Career Highlights

Eide has worked with several prominent companies throughout his career, including GTAT Corporation and Axcelis Technologies, Inc. His work in these organizations has allowed him to develop and refine his innovative technologies, contributing to advancements in the field.

Collaborations

Throughout his career, Paul Eide has collaborated with notable individuals such as Theodore H. Smick and Geoffrey Ryding. These collaborations have further enriched his work and led to significant advancements in ion implantation technology.

Conclusion

Paul Eide's contributions to the field of ion implantation technology through his patents and collaborations highlight his innovative spirit and dedication to advancing scientific knowledge. His work continues to influence the industry and inspire future inventors.