The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2014
Filed:
Nov. 15, 2011
Theodore Smick, Essex, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Hilton Glavish, Incline Village, NV (US);
Takao Sakase, Rowley, MA (US);
William Park, Jr., Somerville, MA (US);
Paul Eide, Stratham, NH (US);
Drew Arnold, Salem, MA (US);
Ronald Horner, Auburndale, MA (US);
Joseph Gillespie, Boston, MA (US);
Theodore Smick, Essex, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Hilton Glavish, Incline Village, NV (US);
Takao Sakase, Rowley, MA (US);
William Park, Jr., Somerville, MA (US);
Paul Eide, Stratham, NH (US);
Drew Arnold, Salem, MA (US);
Ronald Horner, Auburndale, MA (US);
Joseph Gillespie, Boston, MA (US);
GTAT Corporation, Nashua, NH (US);
Abstract
Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H, is directed along a final beam path which is at an angle of at least 45° to the axis of rotation of the scan wheel. Ions are extracted from a source and accelerated along a linear acceleration path to a high implant energy (more than 500 keV) before scanning or mass analysis. The mass analyzer may be located near the axis of rotation and unwanted ions are directed to an annular beam dump which may be mounted on the scan wheel.