The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2005

Filed:

Nov. 07, 2003
Applicants:

Robert Mitchell, Pulborough, GB;

John Gordon, Henfield, GB;

Keith Relleen, Horsham, GB;

Ronald F. Horner, Auburndale, MA (US);

Theodore H. Smick, Essex, MA (US);

Inventors:

Robert Mitchell, Pulborough, GB;

John Gordon, Henfield, GB;

Keith Relleen, Horsham, GB;

Ronald F. Horner, Auburndale, MA (US);

Theodore H. Smick, Essex, MA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J037/317 ;
U.S. Cl.
CPC ...
Abstract

An ion implanter incorporates an r.f. accelerator assembly to provide ions for implant at high energies. The accelerator assembly includes electrodes mounted in the vacuum chamber so as to be movable between an operational position for generating and accelerating electric field and a non operational position within the vacuum chamber displaced clear of the beam path. An Actuator moves the electrode between the operational and non operation positions. For energy implanting, the electrodes are in the operational position and for low energy implants the actuator moves the electrodes to the non operational position clear of the beam path.


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