Richard F Vreeland

Title: Innovations of Richard F. Vreeland

Introduction

Richard F. Vreeland is a notable inventor based in Hillsboro, Oregon, with a remarkable portfolio of 11 patents. His work primarily focuses on advancements in integrated circuit structures, contributing significantly to the field of semiconductor technology.

Latest Patents

Among his latest patents is the innovative design of contact over active gate structures with metal oxide-capped contacts to inhibit shorting. This patent describes an integrated circuit structure that includes a plurality of gate structures above a substrate, each featuring a gate insulating layer. The design incorporates conductive trench contact structures that alternate with the gate structures, each having a metal oxide cap structure. This configuration aims to enhance the reliability of integrated circuits by preventing shorting.

Another significant patent by Vreeland involves interconnect structures and methods of fabrication. This patent outlines an integrated circuit interconnect structure that includes a first interconnect in a first metallization level, adjacent to a first dielectric with a specific carbon content. The structure further includes a second interconnect in a higher metallization level, designed to optimize performance and reliability in integrated circuits.

Career Highlights

Richard F. Vreeland has made substantial contributions to Intel Corporation, where he applies his expertise in semiconductor technology. His innovative designs and patents have played a crucial role in advancing the capabilities of integrated circuits, making them more efficient and reliable.

Collaborations

Throughout his career, Vreeland has collaborated with talented individuals such as Nafees Kabir and William Brezinski. These collaborations have fostered an environment of innovation and creativity, leading to the development of groundbreaking technologies in the semiconductor industry.

Conclusion

Richard F. Vreeland's contributions to the field of integrated circuits through his patents and collaborations highlight his significant impact on semiconductor technology. His work continues to influence advancements in the industry, showcasing the importance of innovation in driving technological progress.