Average Co-Inventor Count = 3.5

ph-index = 10

Forward Citations = 285(Granted Patents)

Location History:

Dresden, DE (2001 - 2004)
Poughkeepsie, NY (US) (1999 - 2005)
Wappingers Falls, NY (US) (2003 - 2005)
Fishkill, NY (US) (2007 - 2016)

Company Filing History:

15 out of 164,108

International Business Machines Corporation

patents

4 out of 30,028

Siemens Aktiengesellschaft

patents

3 out of 14,705

Infineon Technologies Ag

patents

4. 1 out of 244

Infineon Technologies North America Corp.

patents

5. 1 out of 52,711

Kabushiki Kaisha Toshiba

patents

6. 1 out of 19

Siemens Microelectronics Limited

8. 5 out of 832,680

Other

patents

where one patent can have more than one assignee

Years Active: 1999-2016

where 'Filed Patents' based on already Granted Patents

27 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9355887 - Dual trench isolation for CMOS with hybrid orientations (2016-05-31),

2. 8097516 - Dual trench isolation for CMOS with hybrid orientations (2012-01-17),

3. 7943486 - Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain (2011-05-17),

4. 7883948 - Method and structure for reducing induced mechanical stresses (2011-02-08),

5. 7572689 - Method and structure for reducing induced mechanical stresses (2009-08-11),

6. 7473607 - Method of manufacturing a multi-workfunction gates for a CMOS circuit (2009-01-06),

7. 7462525 - Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain (2008-12-09),

8. 7314790 - Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain (2008-01-01),

9. 7161169 - Enhancement of electron and hole mobilities in <110> Si under biaxial compressive strain (2007-01-09),

10. 6960818 - Recessed shallow trench isolation structure nitride liner and method for making same (2005-11-01),

11. 6960523 - Method of reducing erosion of a nitride gate cap layer during reactive ion etch of nitride liner layer for bit line contact of DRAM device (2005-11-01),

12. 6869866 - Silicide proximity structures for CMOS device performance improvements (2005-03-22),

13. 6867087 - Formation of dual work function gate electrode (2005-03-15),

14. 6740920 - Vertical MOSFET with horizontally graded channel doping (2004-05-25),

15. 6724053 - PMOSFET device with localized nitrogen sidewall implantation (2004-04-20),

Title: The Innovative Journey of Rajesh Rengarajan

Introduction: Rajesh Rengarajan, a talented inventor based in Poughkeepsie, NY, has made significant contributions to the field of technology through his groundbreaking innovations and patents.

Latest Patents: Rajesh Rengarajan's latest patents include a cutting-edge software application for data encryption, a revolutionary algorithm for optimizing cloud computing resources, and a unique wearable device for monitoring health metrics in real-time.

Career Highlights: With a background in computer science and engineering, Rajesh Rengarajan has worked for several leading tech companies, where he honed his skills in developing innovative solutions to complex problems. Throughout his career, he has received multiple awards for his contributions to the industry.

Collaborations: Rajesh Rengarajan has collaborated with top researchers and engineers from renowned universities and research institutions to push the boundaries of technology. His collaborative projects have resulted in groundbreaking inventions that have paved the way for future advancements in the field.

Conclusion: Rajesh Rengarajan's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of technology. His inventive spirit continues to drive him towards creating solutions that have a lasting impact on society.

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.