Singapore, Singapore

Qun Ying Lin

USPTO Granted Patents = 8 

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2002-2015

where 'Filed Patents' based on already Granted Patents

8 patents (USPTO):

Title: The Innovations of Qun Ying Lin: A Visionary in Lithographic Technologies

Introduction

Qun Ying Lin, an accomplished inventor based in Singapore, holds a remarkable portfolio of 8 patents. His innovative contributions, particularly in the field of lithography for integrated circuit (IC) manufacturing, showcase his expertise and dedication to pushing the boundaries of technology. Through his work, Lin has made significant strides in improving the reliability and efficiency of lithographic processes.

Latest Patents

Among his latest patents is the "Litho Scanner Alignment Signal Improvement," which presents a method and device for diffracting incident light from a lithographic scanner used in IC processing. This invention involves forming a diffraction grating on a semiconductor substrate, coupled with lithographic alignment marks, ensuring precision in IC production. Another notable patent, "Determination of Lithography Tool Process Condition," describes a technique for preparing a wafer with a photoresist layer, utilizing a pattern matching process to optimize lithographic tool parameters. These innovations are vital for enhancing the accuracy and effectiveness of IC manufacturing techniques.

Career Highlights

Qun Ying Lin has contributed his talents to reputable companies, including Chartered Semiconductor Manufacturing Ltd and Globalfoundries Singapore Pte. Ltd. His tenure at these organizations not only showcases his skills as an engineer but also highlights his role in advancing semiconductor technologies. Lin's extensive experience in the industry has equipped him with the insights necessary to innovate continuously.

Collaborations

Throughout his career, Lin has collaborated with exceptional colleagues such as Sia Kim Tan and Soon Yoeng Tan. Working alongside these professionals in various projects has fostered a dynamic environment conducive to breakthroughs in lithographic solutions. The synergy of ideas shared among these innovators has likely propelled the development of impactful technologies.

Conclusion

Qun Ying Lin stands as a prominent figure in the realm of lithography and semiconductor innovation. His 8 patents reflect not only his technical genius but also his commitment to enhancing IC processes through research and development. As technology continues to evolve, inventors like Lin will remain pivotal in shaping the future of this critical industry.

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