The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Jan. 03, 2005
Sia Kim Tan, Singapore, SG;
Soon Yoeng Tan, Skudai, MY;
Qun Ying Lin, Singapore, SG;
Hury Ming Chong, Singapore, SG;
Liang Choo Hsia, Singapore, SG;
Sia Kim Tan, Singapore, SG;
Soon Yoeng Tan, Skudai, MY;
Qun Ying Lin, Singapore, SG;
Hury Ming Chong, Singapore, SG;
Liang Choo Hsia, Singapore, SG;
Chartered Semiconductor Manufacturing, Ltd., Singapore, SG;
Abstract
A chromeless phase shift mask and Method for making and using. The A chromeless phase shift mask is used to pattern contact holes. The chromeless phase shift mask preferably comprises: a first phase shift region and a second phase shift region; the first region is comprised of a unit cell which is comprised of a rectangular center section and at least three rectangular sections (legs) outwards extending from the rectangular center section. The second region is adjacent to said first region. The interference between the first and second phase shift regions creates a contact hole pattern.