The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
Nov. 30, 2006
Applicants:
Sia Kim Tan, Singapore, SG;
Gek Soon Chua, Singapore, SG;
Qun Ying Lin, Singapore, SG;
Martin Yeo, Singapore, SG;
Inventors:
Sia Kim Tan, Singapore, SG;
Gek Soon Chua, Singapore, SG;
Qun Ying Lin, Singapore, SG;
Martin Yeo, Singapore, SG;
Assignee:
Chartered Semiconductor Manufacturing Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Apparatus is provided for determining presence of contamination on a lithography mask, including: a fluid trap having a base and at least one wall member extending substantially perpendicularly to the base for trapping fluid on a portion of the base when fluid introduced during a cleaning process of the mask is removed.