The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2006
Filed:
Sep. 13, 2003
Qun Ying Lin, Singapore, SG;
Sia Kim Tan, Singapore, SG;
Soon Yoeng Tan, Johor, MY;
Huey Ming Chong, Singapore, SG;
Qun Ying Lin, Singapore, SG;
Sia Kim Tan, Singapore, SG;
Soon Yoeng Tan, Johor, MY;
Huey Ming Chong, Singapore, SG;
Chartered Semiconductor Manufacturing, LTD, Singapore, SG;
Abstract
A structure, a method of fabricating and a method of using a phase shift mask (PSM) having a first phase shifted section, a half tone section, and a second phase shifted section. The first phase shift section and the half tone section are shifted 180 degrees with the second phase shift region. Embodiments provide for (1) a half tone, single trench alternating phase shift mask and (2) a half tone, dual trench alternating phase shift mask. The half tone region provides advantages over conventional alternating phase shift masks.