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Philip H Campbell

This inventor holds 32 USPTO granted patents, primarily in Chemical Vapor Deposition. Top assignee: Micron Technology Incorporated. Active years: 2002-2008.

USPTO Granted Patents = 32

% Patents Active = 25.0

Average Co-Inventor Count = 3.7

ph-index = 13

Forward Citations = 839(Granted Patents)

Location History:

Meridain, ID (US) (2007)
Meridian, ID (US) (2002 - 2008)

Company Filing History:

32 out of 39,176

Micron Technology Incorporated

patents

Years Active: 2002-2008

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Areas of Expertise:

Chemical Vapor Deposition

Plasma Enhanced Deposition

Semiconductor Substrate

Microwave Excitation

Deposition Methods

CVD Apparatus

Titanium Silicide

Atomic Layer Deposition

Process Byproduct Trap

Chamber Performance

Engagement Mechanism

Accessory Attachment

32 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7468104 - Chemical vapor deposition apparatus and deposition method (2008-12-23),

2. 7422986 - Deposition methods utilizing microwave excitation (2008-09-09),

3. 7396570 - Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers (2008-07-08),

4. 7393563 - Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers (2008-07-01),

5. 7329292 - Process byproduct trap and system including same (2008-02-12),

6. 7311947 - Laser assisted material deposition (2007-12-25),

7. 7270715 - Chemical vapor deposition apparatus (2007-09-18),

8. 7234412 - Semiconductor substrate deposition processor chamber liner apparatus (2007-06-26),

9. 7229666 - Chemical vapor deposition method (2007-06-12),

10. 7192487 - Semiconductor substrate processing chamber and accessory attachment interfacial structure (2007-03-20),

11. 7185601 - Chemically sensitive warning apparatus and method (2007-03-06),

12. 7105208 - Methods and processes utilizing microwave excitation (2006-09-12),

13. 7044997 - Process byproduct trap, methods of use, and system including same (2006-05-16),

14. 7033642 - Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer (2006-04-25),

15. 6858264 - Chemical vapor deposition methods (2005-02-22),

Title: The Innovative Journey of Inventor Philip H Campbell

Introduction: Philip H Campbell, a talented inventor based in Meridian, ID (US), has made significant contributions to the field of technology through his creative and groundbreaking inventions.

Latest Patents: Philip H Campbell's latest patents showcase his ingenuity and forward-thinking approach to innovation. His recent inventions focus on enhancing communication systems and improving efficiency in various industries.

Career Highlights: With a successful career spanning over two decades, Philip H Campbell has established himself as a prominent figure in the world of inventions. His innovative solutions have garnered recognition for their practicality and effectiveness.

Collaborations: Throughout his career, Philip H Campbell has collaborated with leading technology companies and research institutions to bring his inventions to life. His partnerships have been instrumental in turning his ideas into tangible products that benefit society.

Conclusion: Philip H Campbell's passion for innovation and dedication to pushing the boundaries of technology have solidified his reputation as a respected inventor in Meridian, ID (US). His continued pursuit of excellence promises a future filled with groundbreaking inventions that will shape the world of tomorrow.

Profile summary based on public USPTO records.

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