The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2007
Filed:
Oct. 10, 2003
Applicants:
Ross S. Dando, Nampa, ID (US);
Dan Gealy, Kuna, ID (US);
Craig M. Carpenter, Boise, ID (US);
Philip H. Campbell, Meridian, ID (US);
Allen P. Mardian, Boise, ID (US);
Inventors:
Ross S. Dando, Nampa, ID (US);
Dan Gealy, Kuna, ID (US);
Craig M. Carpenter, Boise, ID (US);
Philip H. Campbell, Meridian, ID (US);
Allen P. Mardian, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of forming a film on a substrate includes activating a gas precursor to form a material on the substrate by irradiating the gas precursor with electromagnetic energy at a frequency tuned to an absorption frequency of the gas precursor.