The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2008
Filed:
May. 17, 2002
Allen P. Mardian, Boise, ID (US);
Philip H. Campbell, Meridian, ID (US);
Craig M. Carpenter, Boise, ID (US);
Randy W. Mercil, Boise, ID (US);
Sujit Sharan, Chandler, AZ (US);
Allen P. Mardian, Boise, ID (US);
Philip H. Campbell, Meridian, ID (US);
Craig M. Carpenter, Boise, ID (US);
Randy W. Mercil, Boise, ID (US);
Sujit Sharan, Chandler, AZ (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A chemical vapor deposition apparatus includes a deposition chamber defined at least in part by at least one of a chamber sidewall and a chamber base wall. A substrate holder is received within the chamber. At least one process chemical inlet to the deposition chamber is included. At least one of the chamber sidewall and chamber base wall includes a chamber surface having a plurality of purge gas inlets to the chamber therein. The purge gas inlets are separate from the at least one process chemical inlet. A purge gas inlet passageway is provided in fluid communication with the purge gas inlets. Further implementations, including deposition method implementations, are contemplated.