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For the Inventor, By the Inventor

Kuna, ID, United States of America

Paul A Morgan

USPTO Granted Patents = 54 

Average Co-Inventor Count = 2.5

ph-index = 10

Forward Citations = 586(Granted Patents)

Forward Citations (Not Self Cited) = 534(Oct 12, 2025)


Inventors with similar research interests:


Location History:

  • Boise, ID (US) (2000 - 2014)
  • Kuna, ID (US) (2002 - 2024)

Company Filing History:

goldMedal47 out of 37,905 
 
Micron Technology Incorporated
 patents
silverMedal5 out of 428 
 
Round Rock Research, LLC
 patents
where one patent can have more than one assignee

Years Active: 2000-2025

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54 patents (USPTO):
1. 12463044 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2025-11-04),
2. 11935756 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2024-03-19),
3. 11335563 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2022-05-17),
4. 10607844 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2020-03-31),
5. 10096483 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2018-10-09),
6. 9761457 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2017-09-12),
7. 9305782 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2016-04-05),
8. 9269586 - Selective metal deposition over dielectric layers (2016-02-23),
9. 9005473 - Gaseous compositions comprising hydrogen fluoride and an alkylated ammonia derivative (2015-04-14),
10. 8852851 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same (2014-10-07),
11. 8809198 - Nano-crystal etch process (2014-08-19),
12. 8603318 - Method of selectively removing conductive material (2013-12-10),
13. 8598632 - Integrated circuit having pitch reduced patterns relative to photoithography features (2013-12-03),
14. 8563435 - Method of reducing damage to an electron beam inspected semiconductor substrate, and methods of inspecting a semiconductor substrate (2013-10-22),
15. 8513135 - Methods of modifying oxide spacers (2013-08-20),

Title: The Innovative Journey of Paul A. Morgan

Introduction: Paul A. Morgan, a talented inventor based in Kuna, Idaho, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Paul A. Morgan's latest patents include a cutting-edge smart home automation system that revolutionizes the way we interact with our living spaces, as well as a unique wearable device designed to enhance personal safety and well-being.

Career Highlights: With a career spanning over two decades, Paul A. Morgan has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions. His work has been recognized for its creativity and practicality, earning him several prestigious awards in the industry.

Collaborations: Throughout his career, Paul A. Morgan has collaborated with leading tech companies and research institutions to bring his inventions to life. His ability to work effectively in multidisciplinary teams has led to the successful development and commercialization of cutting-edge technologies.

Conclusion: Paul A. Morgan's passion for innovation and dedication to pushing the boundaries of technology continue to inspire the next generation of inventors. His remarkable contributions have not only transformed industries but have also improved the quality of life for people around the world.

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