Location History:
- Itami, JP (2001)
- Hyogo, JP (1994 - 2002)
- Tokyo, JP (2003 - 2008)
Company Filing History:
8 out of 21,351 
5 out of 3,781 
Years Active: 1994-2008
Title: Noriaki Fujiki: Innovator in Semiconductor Technology
Introduction
Noriaki Fujiki is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on innovative semiconductor devices and manufacturing methods that enhance performance and reliability.
Latest Patents
Fujiki's latest patents include a semiconductor device that features fuse elements and a bonding pad. This device comprises a lower-layer substrate, a fuse positioned above it, and a silicon oxide film that covers the fuse and part of the substrate. Notably, the silicon oxide film is thicker than the fuse, with an opening opposite the fuse. Another significant patent details a method for manufacturing a semiconductor device that includes bonding pads and fuse elements. This method involves forming insulating films, etching aluminum layers to create bonding pads and fuse elements, and utilizing plasma chemical vapor deposition for additional insulating layers.
Career Highlights
Throughout his career, Noriaki Fujiki has worked with notable companies such as Mitsubishi Electric Corporation and Renesas Technology Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Fujiki has collaborated with esteemed colleagues, including Takashi Yamashita and Shigeru Harada. Their combined expertise has contributed to advancements in the semiconductor field.
Conclusion
Noriaki Fujiki's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices.