Ome, Japan

Nobuo Owada

This inventor holds 47 USPTO granted patents and 1 published patent application, primarily in Semiconductor Fabrication. Top assignees: Hitachi, Ltd., Renesas Technology Corp., Hitachi Vlsi Engineering Corp.. Active years: 1991-2013.

USPTO Granted Patents = 47 

% Patents Active = 85.1

Average Co-Inventor Count = 5.7

ph-index = 13

Forward Citations = 694(Granted Patents)


Location History:

  • Ohme-shi, Tokyo, JP (1993)
  • Ohme, JP (1991 - 2005)
  • Tokyo, JP (2011)
  • Ome, JP (1993 - 2013)

Company Filing History:


Years Active: 1991-2013

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Areas of Expertise:
Semiconductor
Integrated Circuit
Fabrication Process
Manufacturing Method
Device Architecture
Substrate Processing
3D Stacking
Conductor Interconnections
Silicide Layers
Passivation Layer
Bipolar Devices
EPI Technology
47 patents (USPTO):Explore Patents

Title: Nobuo Owada: An Innovator in Semiconductor Technology

Introduction: Nobuo Owada is a prolific inventor based in Ome, Japan, with an impressive portfolio of 47 patents to his name. His work primarily focuses on advancements in semiconductor technology, contributing significantly to the field of integrated circuit devices. Owada's inventions reflect a deep understanding of semiconductor manufacturing processes and material properties.

Latest Patents: Nobuo Owada’s recent patents showcase his innovative approaches to semiconductor fabrication. One notable patent is for a method of manufacturing semiconductor devices, which involves loading a substrate into a reaction chamber, supplying reactive gases for processing, and unloading the substrate afterward. This process incorporates a first film formation step at a higher temperature to create a silicon film with impurity atoms, followed by a second step at a lower temperature to form a purer silicon film.

Another significant contribution is his patent related to semiconductor integrated circuit devices and their fabrication processes. This innovation features buried interconnections in multiple interconnection layers above a semiconductor substrate. The design enhances electrical connectivity through strategic placements of conductor portions, illustrating Owada's commitment to improving semiconductor efficiency and functionality.

Career Highlights: Nobuo Owada has held significant positions at renowned companies such as Hitachi, Ltd. and Renesas Technology Corporation. His roles have facilitated his growth as an inventor, allowing him to apply his expertise and creativity in developing cutting-edge technology in the semiconductor industry.

Collaborations: Throughout his career, Nobuo Owada has collaborated with talented individuals, including colleagues Hizuru Yamaguchi and Junji Noguchi. These partnerships have not only enriched his experience but have also contributed to the dynamic environment of innovation within the semiconductor field.

Conclusion: With 47 patents and a focus on semiconductor technology, Nobuo Owada exemplifies the impact that dedicated inventors can have on the industry. His latest advancements in manufacturing techniques and integrated circuit design underscore his essential role in propelling semiconductor technology forward. As he continues to innovate, Owada remains a significant figure in shaping the future of electronics.

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