Hamura, Japan

Nobuaki Tsuchiya

This inventor holds 12 USPTO granted patents and 4 published patent applications and 8 EPO patents. Top assignees: Canon Anelva Corporation, Anelva Corporation, Sony Corporation. Active years: 2001-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuaki Tsuchiya. Retrieved from https://idiyas.com/inventor/nobuaki-tsuchiya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12 

% Patents Active = 75.0

 

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 36(Granted Patents)


Location History:

  • Tokyo, JP (2001 - 2012)
  • Hamura, JP (2023 - 2024)

Company Filing History:


Years Active: 2001-2024

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12 patents (USPTO):Explore Patents

Title: Nobuaki Tsuchiya: A Pioneer in Plasma Processing Technology

Introduction

Nobuaki Tsuchiya is an accomplished inventor based in Hamura, Japan, known for his significant contributions to the field of plasma processing technology. With a remarkable portfolio of 12 patents, Tsuchiya has demonstrated innovative thinking and adept engineering skills throughout his career.

Latest Patents

Among his notable inventions, Tsuchiya's latest patents include a sophisticated plasma processing apparatus. This apparatus features a balun with multiple terminals, a grounded vacuum container, and electrodes designed for high-frequency applications. The system utilizes an impedance matching circuit and various power supplies to effectively manage electrical functions within the apparatus. These inventions reflect his deep understanding of complex electronic systems and their practical applications in current technology.

Career Highlights

Tsuchiya has had a fruitful career with positions at renowned companies such as Canon Anelva Corporation and Anelva Corporation. His experiences in these organizations have equipped him with valuable knowledge and skills, further driving his innovative endeavors.

Collaborations

Throughout his career, Tsuchiya has collaborated with esteemed colleagues, including Kazunari Sekiya and Masaharu Tanabe. These partnerships have fostered a productive exchange of ideas, leading to advancements in their respective fields.

Conclusion

Nobuaki Tsuchiya's work exemplifies the essence of innovation in plasma processing technology. His contributions not only further the realms of engineering and electronics but also pave the way for future advancements. With a solid foundation of patents and collaborations, Tsuchiya continues to be a key figure in the development of cutting-edge technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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