The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2001
Filed:
Feb. 16, 1999
Hisaaki Sato, Tokyo, JP;
Tsutomu Tsukada, Chiba-ken, JP;
Shigeru Mizuno, Kanagawa-ken, JP;
Nobuaki Tsuchiya, Tokyo, JP;
Anelva Corporation, Fuchi, JP;
Abstract
A plasma processing apparatus includes a cathode,having a large diameter part,and a long thin small diameter part,, and the upper end surface of the large diameter part,faces the plasma forming space,. The substrate,which is to be processed is mounted on the upper end surface of the large diameter part,. The lower end of the small diameter part,is connected via the matching circuit,to the high frequency power source,. The transmission path within the chamber comprises a large diameter coaxial line, a small diameter coaxial line and a radial line which connects them. The large diameter coaxial line includes the large diameter part,, the first side wall,and the insulator,. The radial line includes the lower surface of the large diameter part,, the upper surface of the bottom plate,and the gap,between them. The small diameter coaxial line includes the small diameter part,, the second side wall,and the gap,. Appropriate impedance matching is achieved between the two coaxial lines and the radial line.