Tokyo, Japan

Tsutomu Tsukada


Average Co-Inventor Count = 2.8

ph-index = 11

Forward Citations = 639(Granted Patents)


Location History:

  • Fuchu, JP (1982 - 1992)
  • Chiba, JP (1999)
  • Tokyo, JP (1983 - 2000)
  • Chiba-ken, JP (1999 - 2001)

Company Filing History:


Years Active: 1982-2001

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18 patents (USPTO):Explore Patents

Title: The Innovations of Tsutomu Tsukada

Introduction

Tsutomu Tsukada is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 18 patents. His work has been instrumental in advancing the capabilities of plasma processing apparatuses.

Latest Patents

One of Tsukada's latest inventions is a plasma processing apparatus that features a cathode with both a large diameter part and a long thin small diameter part. The upper end surface of the large diameter part faces the plasma forming space, where the substrate to be processed is mounted. The lower end of the small diameter part connects to a high-frequency power source via a matching circuit. This design includes a transmission path within the chamber that comprises a large diameter coaxial line, a small diameter coaxial line, and a radial line connecting them. Another notable patent discloses a plasma processing apparatus that utilizes RF energy supplied with a plasma generation gas. This apparatus includes a vacuum chamber, a substrate holder, and a gas introduction means for the plasma generation gas. The antenna design features multiple elements symmetrically arranged, enhancing the efficiency of the RF energy application.

Career Highlights

Tsutomu Tsukada has worked with notable companies such as Anelva Corporation and NEC Corporation. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and contribute to various innovative projects.

Collaborations

Some of Tsukada's coworkers include Katsumi Ukai and Yukito Nakagawa. Their collaborative efforts have furthered advancements in the field of plasma processing.

Conclusion

Tsutomu Tsukada's contributions to plasma processing technology through his numerous patents highlight his innovative spirit and dedication to advancing this field. His work continues to influence the industry and inspire future innovations.

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