The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 1987

Filed:

Mar. 21, 1985
Applicant:
Inventors:

Tsutomu Tsukada, Fuchu, JP;

Ishao Ashaishi, Fuchu, JP;

Tatsunori Koizumi, Fuchu, JP;

Kouji Ikeda, Fuchu, JP;

Assignee:

Anelva Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
55195 ; 55208 ; 55387 ;
Abstract

An exhaust system utilizes a booster pump and an auxiliary pump of vacuum process apparatus which vacuum treats a substrate with gases of the chlorine series. A vessel of the auxiliary pump on the air exhaust side is filled with an inert gas of a pressure higher than the atmospheric pressure, and a dry adsorption column capable of adsorbing the gases of the chlorine series is connected to an air exhaust pipe of the auxiliary pump. Further, a dust trap having a cooling surface is provided between the booster pump and the auxiliary pump, and the wall surface of the gas passage between the booster pump and the auxiliary pump is heated.


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