Company Filing History:
Years Active: 1980-2010
Title: **The Innovations of Hisaaki Sato: A Visionary in High-Frequency Plasma Technology**
Introduction
Hisaaki Sato, an accomplished inventor based in Tokyo, Japan, has significantly contributed to the field of high-frequency plasma technology. With a remarkable portfolio of eight patents, Sato's innovations focus on advanced processing apparatuses that play a crucial role in various industrial applications.
Latest Patents
Among his latest innovations is the High-Frequency Plasma Processing Apparatus. This groundbreaking application reveals a sophisticated design featuring a process chamber that accommodates the substrate to be processed. The apparatus includes a process-gas introduction line for introducing a process gas into the chamber. A first high-frequency (HF) electrode, linked to a first HF power source, generates plasma from the process gas. Additionally, a second HF electrode complements the first, creating a discharge space while a series resonator connects the second HF electrode to the ground. This innovative setup operates at a frequency not lower than 30 MHz, with the series resonator functioning as a distributed constant circuit.
Career Highlights
Hisaaki Sato has made significant strides in his career by working with prominent companies such as Anelva Corporation and Nippon Electric Co., Ltd. His expertise in plasma processing apparatuses has positioned him as a key figure in technological advancements within these organizations.
Collaborations
Throughout his career, Sato has collaborated with esteemed professionals in the industry, including Tsutomu Tsukada and Nobuaki Tsuchiya. Their joint efforts have fostered innovation and have been instrumental in developing and refining high-frequency plasma technologies.
Conclusion
Hisaaki Sato's contributions to high-frequency plasma technology demonstrate his dedication as an inventor. With his impressive portfolio and collaboration with industry leaders, Sato continues to influence and enhance the field, paving the way for future innovations in plasma processing.
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