The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2023
Filed:
Sep. 17, 2020
Canon Anelva Corporation, Kawasaki, JP;
Masaharu Tanabe, Fuchu, JP;
Kazunari Sekiya, Hachioji, JP;
Tadashi Inoue, Sagamihara, JP;
Hiroshi Sasamoto, Tachikawa, JP;
Tatsunori Sato, Hachioji, JP;
Nobuaki Tsuchiya, Hamura, JP;
Atsushi Takeda, Yokohama, JP;
CANON ANELVA CORPORATION, Kawasaki, JP;
Abstract
A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.