Fuchu, Japan

Masaharu Tanabe

This inventor holds 7 USPTO granted patents and 7 EPO patents. Top assignee: Canon Anelva Corporation. Active years: 2023-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaharu Tanabe. Retrieved from https://idiyas.com/inventor/masaharu-tanabe

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 6.6

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2023-2024

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7 patents (USPTO):Explore Patents

Title: Masaharu Tanabe: Innovator in Plasma Processing Technology

Introduction: Masaharu Tanabe is a distinguished inventor hailing from Fuchu, Japan. With a remarkable portfolio of seven patents, Tanabe has made significant contributions to the field of plasma processing technology, particularly through his work at Canon Anelva Corporation.

Latest Patents: Among his latest innovations is an advanced plasma processing apparatus. This apparatus integrates various components, including a balun with unbalanced and balanced terminals, a grounded vacuum container, and multiple electrodes configured for optimal performance. The design features an impedance matching circuit and a dual power supply system, enhancing the efficiency of the plasma processing.

Career Highlights: Throughout his career, Masaharu Tanabe has been at the forefront of technological advancements in his field. His expertise is reflected in his numerous patents, which showcase innovative applications in plasma technology that are pivotal for various industrial uses.

Collaborations: Tanabe has had the opportunity to collaborate with notable colleagues, including Kazunari Sekiya and Tadashi Inoue. Together, they have contributed to groundbreaking research and development initiatives, driving the progress of plasma processing technology.

Conclusion: Masaharu Tanabe is an exemplary inventor whose work continues to influence the evolution of plasma processing systems. His dedication to innovation at Canon Anelva Corporation underscores his position as a key player in the advancement of technology in Japan and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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