The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2023
Filed:
Dec. 19, 2019
Applicant:
Canon Anelva Corporation, Kawasaki, JP;
Inventors:
Atsushi Takeda, Yokohama, JP;
Takayuki Moriwaki, Hino, JP;
Tadashi Inoue, Sagamihara, JP;
Masaharu Tanabe, Fuchu, JP;
Kazunari Sekiya, Hachioji, JP;
Hiroshi Sasamoto, Tachikawa, JP;
Tatsunori Sato, Hachioji, JP;
Nobuaki Tsuchiya, Hamura, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32541 (2013.01); H01J 37/18 (2013.01); H01J 37/3255 (2013.01); H01J 37/32449 (2013.01); H01J 2237/327 (2013.01); H01J 2237/334 (2013.01);
Abstract
A plasma processing apparatus includes a balun having a first unbalanced terminal, a second unbalanced terminal, a first balanced terminal, and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, and a ground electrode arranged in the vacuum container and grounded.