The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Oct. 28, 2021
Applicant:
Canon Anelva Corporation, Kawasaki, JP;
Inventors:
Kazunari Sekiya, Hachioji, JP;
Masaharu Tanabe, Fuchu, JP;
Tadashi Inoue, Sagamihara, JP;
Hiroshi Sasamoto, Tachikawa, JP;
Tatsunori Sato, Hachioji, JP;
Nobuaki Tsuchiya, Hamura, JP;
Assignee:
CANON ANELVA CORPORATION, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32541 (2013.01); H01J 37/18 (2013.01); H01J 37/3255 (2013.01); H01J 37/32449 (2013.01); H01J 2237/327 (2013.01); H01J 2237/334 (2013.01);
Abstract
A plasma processing apparatus includes a balun having a first input terminal, a second input terminal, a first output terminal, and a second output terminal, a vacuum container, a first electrode electrically connected to the first output terminal, a second electrode electrically connected to the second output terminal, and a connection unit configured to electrically connect the vacuum container and ground, the connection unit including an inductor.