Introduction: Naotaka Noro, an accomplished inventor hailing from Nirasaki, Japan, has made significant contributions to the field of plasma technology. With a remarkable portfolio of 13 patents, Noro's innovative techniques have paved the way for advancements in semiconductor manufacturing and related technologies.

Latest Patents: Among Naotaka Noro's latest patents is an innovative etching method, which consists of a modification process and a removal process. During the modification process, a fluorine-containing gas is supplied to an object possessing a silicon oxide film, resulting in the formation of a modification layer on the film's surface. The subsequent removal process involves exposing the modified object to plasma generated from ammonia-containing gas, effectively removing the modification layer. This technique emphasizes efficiency, as the modification and removal processes are alternately repeated multiple times.

Another notable patent is Noro's plasma processing method, carried out under controlled conditions within a chamber body. In this method, a substrate is positioned on a support stage while plasma treatment is performed on it. Importantly, a phase adjustment circuit allows for the relative adjustment of the voltage phases between the upper and lower electrodes. This adjustment ensures the thickness of the sheath between the plasma and support stage remains stable, enabling efficient plasma treatment without extinguishing the generated plasma. Following treatment, gases and particles within the chamber are expelled using an exhaust device, enhancing overall process cleanliness.

Career Highlights: Noro's noteworthy innovations have been instrumental in his career at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work is characterized by an emphasis on continuous improvement and efficiency, underscoring his status as a key contributor to the company's technological advancements.

Collaborations: Throughout his career, Naotaka Noro has collaborated with esteemed colleagues, including Toshio Hasegawa and Miyako Kaneko. These collaborations have enhanced the synergy of ideas and advancements within their projects, further driving innovation in the field.

Conclusion: Naotaka Noro's contributions to plasma processing technology exemplify the impact of inventive thinking on modern manufacturing techniques. With a strong portfolio of patents and a dedication to innovation, Noro continues to inspire future advancements in the semiconductor industry and beyond. His work not only showcases his expertise but also highlights the collaborative spirit essential for fostering technological progress.

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