The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2021
Filed:
Oct. 13, 2017
Tokyo Electron Limited, Tokyo, JP;
Naotaka Noro, Nirasaki, JP;
Toshio Hasegawa, Nirasaki, JP;
Tamaki Takeyama, Nirasaki, JP;
Shinya Iwashita, Nirasaki, JP;
Katsuhito Hirose, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A film forming apparatusincludes a plasma generating mechanismcommonly used for plasmarizing a processing gas and a cleaning gas supplied into a processing vesselin which a vacuum atmosphere is formed; an exhaust deviceconfigured to evacuate an exhaust lineconnected to a processing gas discharge unitwhile the plasmarization of the cleaning gas is being performed by the plasma generating mechanism; a tankprovided at the exhaust line; and a valve Vwhich is provided at the exhaust linebetween the tankand the processing gas discharge unit. The valve Vis configured to be closed to reduce an internal pressure of the tankand opened to attract the plasmarized cleaning gas into the tankfrom a processing spacethrough the processing gas discharge unit