Location History:
- Nirasaki, JP (2009 - 2021)
- Yamanashi, JP (2024)
Company Filing History:
Years Active: 2009-2025
Title: The Innovative Contributions of Tamaki Takeyama
Introduction
Tamaki Takeyama is a prominent inventor based in Yamanashi, Japan. She has made significant contributions to the field of substrate processing and film thickness measurement. With a total of four patents to her name, her work has advanced the technology used in various industrial applications.
Latest Patents
One of her latest patents is a method and device for substrate processing. This invention includes a substrate processing device with a rotatable stage, a frozen heat transfer body, and a gas supply mechanism. The method allows for the continuous processing of multiple substrates while maintaining a steady cooling temperature. Another notable patent is a film thickness measuring apparatus and method. This apparatus measures the thickness of a film in-situ within a film forming apparatus, utilizing a light emitter and a light receiving sensor to ensure accurate measurements.
Career Highlights
Tamaki Takeyama has worked with notable companies, including Tokyo Electron Limited. Her experience in these organizations has allowed her to refine her skills and contribute to innovative projects in the semiconductor industry.
Collaborations
Throughout her career, she has collaborated with esteemed colleagues such as Hiroaki Chihaya and Masato Shinada. These partnerships have fostered a creative environment that has led to groundbreaking advancements in her field.
Conclusion
Tamaki Takeyama's innovative work in substrate processing and film thickness measurement has made her a key figure in her industry. Her patents reflect her dedication to advancing technology and improving industrial processes.