The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Feb. 21, 2006
Tamaki Takeyama, Nirasaki, JP;
Munehisa Futamura, Nirasaki, JP;
Tamaki Takeyama, Nirasaki, JP;
Munehisa Futamura, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing method using a substrate processing apparatus including: a process container holding a substrate to be processed therein; first gas supplying means having flow rate adjusting means for supplying a first process gas to the process container; and second gas supplying means supplying a second process gas to the process container, the substrate processing method including: a first step of controlling a flow rate of the first process gas to be a first flow rate by the flow rate adjusting means and supplying the first process gas in a first direction; a second step of discharging the first process gas from the process container; a third step of supplying the second process gas to the process container; and a fourth step of discharging the second process gas from the process container, in a repeated manner, wherein a step of stabilizing the flow rate of the process gas is set between a primary first step and a secondary first step performed subsequently to the primary first step.