The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Aug. 03, 2017
Tokyo Electron Limited, Tokyo, JP;
Miyako Kaneko, Nirasaki, JP;
Naotaka Noro, Nirasaki, JP;
Tsuyoshi Takahashi, Nirasaki, JP;
Kazuyoshi Yamazaki, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A metal-containing film can be formed with high continuity with respect to a base when forming the metal-containing film on the base by CVD or ALD. A film forming method of forming, by ALD or CVD, a Ti-containing film on a base film of a processing target object having a SiOfilm as the base film includes performing a surface processing of accelerating formation of a silanol group on a surface of the SiOfilm by bringing a fluid containing O and H into contact with the surface of the SiOfilm; and performing a film forming processing of forming the Ti-containing film on the SiOfilm, on which the surface processing is performed, by the ALD or the CVD with a Ti source gas which reacts with the silanol group.