Location History:
- Tokyo-To, JP (2012)
- Nirasaki, JP (2010 - 2014)
- Tokyo, JP (2022)
Company Filing History:
8 out of 10,326 
1 out of 130 
1 out of 6,008 
Years Active: 2010-2022
Title: Naoki Yoshii: Innovator in Plasma Technology and Semiconductor Growth
Introduction
Naoki Yoshii is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the fields of plasma technology and semiconductor manufacturing. With a total of 8 patents, his work has advanced the capabilities of various technologies.
Latest Patents
Yoshii's latest patents include a plasma spraying device and a method for manufacturing battery electrodes. This innovative device features a supplying section that conveys feedstock powder with a plasma generating gas. It injects the feedstock powder and gas from a tip opening. The plasma generating section generates plasma by decomposing the injected gas using electric power ranging from 500 W to 10 kW. The enclosed chamber allows for the deposition of the feedstock powder on a workpiece by melting it with the generated plasma. The feedstock powder can include materials such as lithium, aluminum, copper, silver, and gold, with particle diameters between 1 µm and 50 µm.
Another notable patent involves an epitaxial growth method for a zinc oxide-based semiconductor layer. This method includes forming a buffer layer with an orienting film of oxide or nitride on a heterogeneous substrate. It also details the crystal growth of a zinc oxide-based semiconductor layer using a halogenated group II metal and an oxygen material. The patent outlines both hetero and homo epitaxial growth methods, enhancing the efficiency of semiconductor devices.
Career Highlights
Throughout his career, Naoki Yoshii has worked with esteemed organizations such as Tokyo Electron Limited and Tokyo University of Agriculture and Technology. His experience in these institutions has allowed him to refine his expertise in plasma technology and semiconductor development.
Collaborations
Yoshii has collaborated with notable colleagues, including Yasuhiko Kojima and Tadahiro Ishizaka. These partnerships have contributed to the advancement of his research and innovations.
Conclusion
Naoki Yoshii's contributions to plasma technology and semiconductor growth have established him as a key figure in his field. His innovative patents and collaborations reflect his commitment to advancing technology. His work continues to influence the development of new materials and methods in the industry.