The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Sep. 23, 2005
Tadahiro Ishizaka, Nirasaki, JP;
Naoki Yoshii, Nirasaki, JP;
Kohei Kawamura, Nirasaki, JP;
Yukio Fukuda, Nakakoma-gun, JP;
Takashi Shigeoka, Nirasaki, JP;
Yasuhiko Kojima, Nirasaki, JP;
Yasuhiro Oshima, Nirasaki, JP;
Junichi Arami, Tokyo, JP;
Atsushi Gomi, Nirasaki, JP;
Tadahiro Ishizaka, Nirasaki, JP;
Naoki Yoshii, Nirasaki, JP;
Kohei Kawamura, Nirasaki, JP;
Yukio Fukuda, Nakakoma-gun, JP;
Takashi Shigeoka, Nirasaki, JP;
Yasuhiko Kojima, Nirasaki, JP;
Yasuhiro Oshima, Nirasaki, JP;
Junichi Arami, Tokyo, JP;
Atsushi Gomi, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing apparatus is disclosed which is capable of switching supplies of a raw material gas and a reducing gas alternately, while continuously forming a plasma of the reducing gas. An excitation device () excites a reducing gas supplied thereinto, and the excited reducing gas is supplied into a process chamber (). A switching mechanism () is arranged between the excitation device () and the process chamber (), and a bypass line () is connected to the switching mechanism (). The switching mechanism () switches the flow of the excited reducing gas from the excitation device () between the process chamber () and the bypass line ().