The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Nov. 21, 2007
Kenjiro Koizumi, Nirasaki, JP;
Naoki Yoshii, Nirasaki, JP;
Kenjiro Koizumi, Nirasaki, JP;
Naoki Yoshii, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention provides a gas introducing mechanism and a processing apparatus for processing an object to be processed, which can supply a gas uniformly over the whole region of a processing space so as to enhance uniformity of a process in the surface of the object to be processed. The gas introducing mechanism, which is adapted to provide a process to the object W to be processed, by using the gas, in a processing vessel, includes a gas introducing ring memberfor introducing the gas from the exterior of the processing vessel, a disk-like rotary baseprovided rotatably below a top platein the processing vessel, and a ring-shaped gas injection ring memberprovided around a rotary baseso as to be closer and opposed to the gas introducing ring member. A gas injecting slitis provided in the ring-shaped gas injection ring member, the slitbeing formed along the circumferential direction of the rotary base. A ring-shaped gas guide grooveis provided on at least either one of opposing side faces of the gas introducing ring memberand gas injection ring member, along the circumferential direction, corresponding to a gas introducing port.