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For the Inventor, By the Inventor

Seongnam, South Korea

Myoung Soo Kim

This inventor holds 22 USPTO granted patents and 6 published patent applications, primarily in Semiconductor Fabrication. Top assignees: Skhynix Inc., Hyundai Electronics Industries Co. Ltd., Hyundai Electronics Industries. Active years: 2001-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Myoung Soo Kim. Retrieved from https://idiyas.com/inventor/myoung-soo-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 90.9

Average Co-Inventor Count = 4.1

ph-index = 6

Forward Citations = 1,964(Granted Patents)


Location History:

  • Kyoungki-do, KR (2001 - 2003)
  • Seongnam-si, KR (2014)
  • Gyeonggi-do, KR (2016)
  • Seongnam, KR (2015 - 2019)

Company Filing History:

goldMedal13 out of 11,678 
 
Skhynix Inc.
 patents
silverMedal8 out of 2,340 
 
Hyundai Electronics Industries Co. Ltd.
 patents
bronzeMedal1 out of 29 
 
Hyundai Electronics Industries
 patents

Years Active: 2001-2019

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Areas of Expertise:
Nano-Scale Structures
Fine Pattern Structures
Block Co-Polymer Materials
Semiconductor Devices
Bit Line Structures
Photoresist Monomers
Photoresist Polymers
Micro Pattern Formation
Trench Structures
Buried Metal Silicide Layers
Photoresist Cross-Linker
Photomask
22 patents (USPTO):Explore Patents
1. 10504726 - Nano-scale structures (2019-12-10),
2. 9840059 - Fine pattern structures having block co-polymer materials (2017-12-12),
3. 9666585 - Method of manufacturing a semiconductor device having bit line structures disposed in trenches (2017-05-30),
4. 9257281 - Methods of fabricating a pattern using the block co-polymer materials (2016-02-09),
5. 9202775 - Semiconductor devices having bit line structures disposed in trenches (2015-12-01),
6. 9190274 - Methods of fabricating fine patterns (2015-11-17),
7. 9165769 - Fine pattern structures having block co-polymer materials (2015-10-20),
8. 9147595 - Semiconductor devices having buried metal silicide layers and methods of fabricating the same (2015-09-29),
9. 9086632 - Fine pattern structures having block co-polymer materials and methods of fabricating the same (2015-07-21),
10. 9082718 - Fine pattern structures having block co-polymer materials (2015-07-14),
11. 8999862 - Methods of fabricating nano-scale structures and nano-scale structures fabricated thereby (2015-04-07),
12. 8962491 - Methods of fabricating semiconductor devices and semiconductor devices fabricated thereby (2015-02-24),
13. 8906584 - Photomask and method for forming pattern of semiconductor device using the same (2014-12-09),
14. 6514666 - Photoresist monomers, polymers thereof and photoresist compositions containing it (2003-02-04),
15. 6482565 - Photoresist cross-linker and photoresist composition comprising the same (2002-11-19),

Title: Myoung Soo Kim: Innovator in Nano-Scale Structures

Introduction: Myoung Soo Kim, an accomplished inventor based in Seongnam, South Korea, holds an impressive total of 22 patents primarily focused on advanced nano-scale structures and fine pattern structures. His innovative contributions have significantly impacted the fields of nanotechnology and materials science.

Latest Patents: Among his latest patents, Kim has developed a unique nano-scale structure that incorporates an array of pillars situated over an underlying layer. This structure features a separation wall layer, which includes first separation walls formed on the pillars' sidewalls. Additionally, the block co-polymer (BCP) layer fills gaps between the pillars and is phase-separated to create first domains that yield second separation walls over the first walls. Another noteworthy patent describes a fine pattern structure that consists of a lower hard mask layer on a pattern formation layer with distinct regions. This innovation includes various hard mask patterns and block co-polymer layers, meticulously designed to enhance pattern formation in semiconductor technologies.

Career Highlights: Myoung Soo Kim has achieved significant milestones throughout his career. He has worked with leading companies such as SK Hynix Inc. and Hyundai Electronics Industries Co., Ltd. His expertise in nano-scale technologies has made him a key contributor to advancements in the semiconductor industry.

Collaborations: Throughout his professional journey, Kim has collaborated with numerous talented individuals, including Cheol Kyu Bok and Keun Do Ban. These collaborations have fostered a dynamic exchange of ideas and innovations, leading to the successful development of cutting-edge technologies.

Conclusion: Myoung Soo Kim's dedication to innovation and excellence has positioned him as a prominent figure within the realm of nano-scale structures. His patents and collaborative efforts continue to influence advancements in technology, shaping the future of materials science and semiconductor development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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