The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Jun. 12, 2015
Applicant:
SK Hynix Inc., Icheon, KR;
Inventors:
Keun Do Ban, Yongin, KR;
Cheol Kyu Bok, Pohang, KR;
Myoung Soo Kim, Seongnam, KR;
Jung Gun Heo, Icheon, KR;
Assignee:
SK hynix Inc., Icheon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/205 (2006.01); H01L 33/00 (2010.01); H01L 23/58 (2006.01); H01L 23/04 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0274 (2013.01); H01L 21/0337 (2013.01); H01L 21/3086 (2013.01);
Abstract
A fine pattern structure includes a layer having or including alternating protrusion portions and recess portions, polymer patterns disposed in recess regions formed by the recess portions, brush patterns disposed on top surfaces of the protrusion portions, and a block co-polymer layer including first polymer block patterns formed on the brush patterns and second polymer block patterns formed on the polymer patterns.
Ban, Keun. (2015). Fine pattern structures having block co-polymer materials (U.S. Patent No. 9165769). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9165769
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile