Murray D Sirkis

Title: Innovations of Murray D Sirkis

Introduction

Murray D Sirkis is a notable inventor based in Tempe, Arizona, recognized for his contributions to plasma processing technology. With a total of 12 patents to his name, Sirkis has made significant advancements in the field, particularly in methods and apparatuses that enhance the uniformity of plasma processing.

Latest Patents

Among his latest patents is a method and apparatus for improved plasma processing uniformity. This invention involves generating and controlling plasma in a capacitively coupled plasma system, utilizing a plasma electrode and a bias electrode in the form of a workpiece support member. The design features multiple regions defined by RF power feed lines, allowing for precise control over the plasma characteristics. Another significant patent addresses the addition of power at selected harmonics of the plasma processor drive frequency. This method controls non-uniformities in plasma-processed semiconductor wafers by supplying the plasma with both a primary electrical signal and a supplemental electrical signal, enabling enhanced control over the plasma parameters.

Career Highlights

Sirkis has had a distinguished career, working with prominent companies such as Tokyo Electron Limited and Xerox Corporation. His work has been instrumental in advancing technologies that are critical to semiconductor manufacturing and plasma processing.

Collaborations

Throughout his career, Sirkis has collaborated with notable professionals in the field, including Wayne L Johnson and Joseph T Verdeyen. These collaborations have contributed to the development of innovative solutions in plasma technology.

Conclusion

Murray D Sirkis stands out as a significant figure in the realm of plasma processing innovations. His patents and career achievements reflect his dedication to advancing technology in this critical area.