The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2004
Filed:
Jan. 17, 2003
Applicant:
Inventors:
Murray D. Sirkis, Tempe, AZ (US);
Eric Strang, Chandler, AZ (US);
Yu Wang Bibby, St. Albans, VT (US);
John E. Cronin, Milton, VT (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 1/000 ;
U.S. Cl.
CPC ...
B23K 1/000 ;
Abstract
A plasma processing system includes an automated electrode retention mechanism ( ) for providing automated engagement of a source electrode ( ) with a drive electrode ( ). In addition, an automated electrode handling system ( ) is provided that has the ability to remove a source electrode ( ) from the electrode retention mechanism and replace it with a second source electrode ( ) that is stored in a staging area ( ) outside the plasma processing system vacuum chamber. The system may operate automatically under program control of a computer system ( ) coupled thereto.