The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2003
Filed:
Apr. 25, 2002
Applicant:
Inventors:
Murray D. Sirkis, Tempe, AZ (US);
Joseph T. Verdeyen, Savoy, IL (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 7/24 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H01J 7/24 ; C23C 1/600 ;
Abstract
A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.
Sirkis, Murray. (2003). Stabilized oscillator circuit for plasma density measurement (U.S. Patent No. 6646386). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6646386
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile