The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6891124 B1

PDF
Full Text
Expired
Date of Patent:
May. 10, 2005

Filed:

Jan. 05, 2001
Applicants:

Medona B. Denton, Tuscon, AZ (US);

Wayne L. Johnson, Phoenix, AZ (US);

Murray D. Sirkis, Tempe, AZ (US);

Inventors:

Medona B. Denton, Tuscon, AZ (US);

Wayne L. Johnson, Phoenix, AZ (US);

Murray D. Sirkis, Tempe, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K010/00 ;
U.S. Cl.
CPC ...
Abstract

A method and system for using transmission spectroscopy to measure a temperature of a substrate (). By passing light through a substrate, the temperature of the substrate can be determined using the band-edge characteristics of the wafer. This in-situ method and system can be used as a feedback control in combination with a variable temperature substrate holder () to more accurately control the processing conditions of the substrate. By utilizing a multiplicity of measurement sites the variation of the temperature across the substrate () can also be measured.


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Denton, Medona. (2005). Method of wafer band-edge measurement using transmission spectroscopy and a process for controlling the temperature uniformity of a wafer (U.S. Patent No. 6891124). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6891124

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