Tokyo, Japan

Mitsuaki Komino

This inventor holds 25 USPTO granted patents and 2 published patent applications, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Motoyama Eng. Works, Ltd., Tokyo Electron Yamanashi Limited. Active years: 1994-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mitsuaki Komino. Retrieved from https://idiyas.com/inventor/mitsuaki-komino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 88.0

Average Co-Inventor Count = 2.4

ph-index = 19

Forward Citations = 3,667(Granted Patents)


Location History:

  • Tokyo, JP (1994 - 2003)
  • Nakano-Ku, JP (1996 - 2006)
  • Tokyo-To, JP (2000 - 2008)

Company Filing History:


Years Active: 1994-2008

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Areas of Expertise:
Electrode
Susceptor
Plasma Treatment
Semiconductor Manufacturing
Control Method
Gas System
Electrostatic Chuck
Vapor Generation
Drying Processing
Pressure Control
Temperature Control
Vacuum Exhaust
25 patents (USPTO):Explore Patents

Title: **Mitsuaki Komino: Innovations in Plasma Processing Technologies**

Introduction

Mitsuaki Komino is an accomplished inventor based in Tokyo, Japan, known for his remarkable contributions to the field of plasma processing technologies. With a portfolio of 25 patents, Komino has been instrumental in advancing methods and apparatuses that enhance manufacturing processes, particularly in semiconductor fabrication.

Latest Patents

Among his latest innovations are pivotal patents concerning electrodes and susceptors for plasma processing apparatuses. One notable patent describes a susceptor that incorporates a heater in a planar state, along with upper and lower ceramic-metal composites that sandwich the heater. This innovative design not only features a ceramic electrostatic chuck for securely attracting and holding objects during treatment but also addresses the challenges of thermal expansion by ensuring that the electrostatic chuck has a coefficient of linear thermal expansion that matches that of the upper ceramic-metal composite. This design effectively mitigates risks of peeling or cracking due to thermal fluctuations.

Another significant patent presents an electrode structure utilized within a plasma processing apparatus. This apparatus is designed to perform processes on objects using plasma in a vacuum chamber. The electrode unit incorporates a heater and a cooling block equipped with a cooling jacket, ensuring efficient thermal management. The addition of a heat-resistant metal seal allows for a stable and reliable operation even at elevated temperatures, withstanding conditions exceeding 200°C, specifically within the range of 350°C to 500°C.

Career Highlights

Mitsuaki Komino has built a distinguished career working with esteemed companies in the technology sector. He has been associated with Tokyo Electron Limited, a leading manufacturer of semiconductor production equipment, and Motoyama Engineering Works, Ltd., where he has honed his expertise in plasma technology and processing solutions. His dedication to innovation has established him as a key figure in his field.

Collaborations

Throughout his career, Komino has collaborated with notable professionals, including Osamu Uchisawa and Yoichi Ueda. These partnerships have not only enriched his work but have also contributed to the advancement of plasma processing technologies, fostering a culture of innovation and collaboration within the industry.

Conclusion

Mitsuaki Komino's contributions to the world of plasma processing apparatus and technologies underscore his status as a leading inventor in the field. His latest patents are a testament to his continuous pursuit of innovation and excellence, paving the way for more efficient manufacturing processes in the semiconductor industry. As he continues to push the boundaries of technology, Komino's work serves as an inspiration for future generations of inventors and engineers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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