The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2006
Filed:
Sep. 22, 2000
Mitsuaki Komino, Nakano-ku, JP;
Yasuharu Sasaki, Tsukui-gun, JP;
Kyo Tsuboi, Tsukui-gun, JP;
Hideaki Amano, Tsukui-gun, JP;
Mitsuaki Komino, Nakano-ku, JP;
Yasuharu Sasaki, Tsukui-gun, JP;
Kyo Tsuboi, Tsukui-gun, JP;
Hideaki Amano, Tsukui-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An electrode structure used in a plasma processing apparatus which performs a predetermined process on an object (W) to be processed by using a plasma in a process chamber () in which a vacuum can be formed. An electrode unit () has a heater unit () therein. A cooling block () having a cooling jacket () is joined to the electrode unit () so as to cool the electrode unit. A heat resistant metal seal member (A,B) seals an electrode-side heat transfer space () formed between the electrode unit and the cooling block. Electrode-side heat transfer gas supply means () supplies a heat transfer gas to the electrode-side heat transfer space. Accordingly, a sealing characteristic of the electrode-side heat transfer space does not deteriorate even in a high temperature range such as a temperature higher than 200° C. and, for example, a range from 350° C. to 500° C., and the heat transfer gas does not leak.