Inventors with similar research interests:
Location History:
- I-Lan, TW (2003)
- Jhubei, TW (2009 - 2013)
- Hsinchu County, TW (2015)
- Hsinchu, TW (2009 - 2024)
Company Filing History:
Years Active: 2003-2025
Title: The Remarkable Innovations of Ming-Hua Yu
Introduction: Ming-Hua Yu is a renowned inventor based in Hsinchu, Taiwan, notable for his contributions to semiconductor technology. With an impressive portfolio of 106 patents, Yu's work significantly impacts the field of Fin Field-Effect Transistors (FinFETs) and semiconductor devices.
Latest Patents: Among his latest innovations, Yu has developed a method for source/drain formation with reduced selective loss defects. This method involves the formation of semiconductor fins in both n-type and p-type FinFET regions, utilizing dielectric fins, and a series of epitaxy processes aimed at optimizing device performance. Additionally, Yu has patented a semiconductor device that incorporates a first fin and gate stack, complemented by strategically placed epitaxial layers with varying dopant concentrations, further enhancing the functionality and efficiency of semiconductor components.
Career Highlights: Yu has made substantial strides in the semiconductor industry, currently working at Taiwan Semiconductor Manufacturing Company Limited (TSMC). His innovative approaches and contributions to the development of advanced semiconductor technologies emphasize his status as a leading figure in the industry.
Collaborations: Throughout his career, Ming-Hua Yu has collaborated with notable colleagues such as Tze-Liang Lee and Yi-Jing Lee, fostering innovation through collective expertise and diverse perspectives.
Conclusion: Ming-Hua Yu's significant contributions to the field of semiconductor technology through his numerous patents illustrate the profound impact of his work. His innovative methods and collaboration with esteemed colleagues continue to shape the future of the industry, establishing him as a pivotal inventor in his field.
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