Min Li

Title: Min Li: An Innovative Force in Magnetic Head Device Technology

Introduction:

In the realm of magnetic head devices, Min Li has proven himself as a visionary inventor with a rich portfolio of patents. With over 200 patents to his name, Li has made significant contributions to the field, particularly in critical dimension patterning and adaptive bias control. This article sheds light on his latest patents, career highlights, collaborations, and his invaluable impact on the industry.

Latest Patents:

Among Li's recent patents, two stand out as remarkable advancements in magnetic head device technology.

1. Method of Ultra-Fine Critical Dimension Patterning for Magnetic Head Devices:

Li's invention discloses methods for critical dimension uniformity control, which are crucial in optimizing the performance of magnetic head devices. By precisely patterning the hard mask layer using innovative mask techniques, forming a mandrel pattern, and creating a sidewall spacer pattern, Li has paved the way for enhanced manufacturing processes and improved device yield.

2. Adaptive Bias Control for Magnetic Recording Head:

Another significant patent by Li involves the incorporation of a permanent magnet (PM) layer in the read head of magnetic recording devices. This PM layer, positioned near the free layer, enables adjustments to the free layer's bias point and substantially reduces sensor asymmetry (Asym). By leveraging different initialization schemes and directions, Li's invention offers a significant leap in device yield and overall performance.

Career Highlights:

Li's groundbreaking work in magnetic head technology has been shaped by his tenure at esteemed companies in the industry. He has made notable contributions during his time at both Headway Technologies, Incorporated and TDK Corporation.

Headway Technologies, Incorporated:

During his tenure at Headway Technologies, Li contributed substantially to various research and development projects, cementing his expertise in the field. His innovative mindset and expertise in critical dimension patterning laid the foundation for several advancements in magnetic head device fabrication.

TDK Corporation:

At TDK Corporation, Li continued to make significant strides in magnetic head technology. His expertise in adaptive bias control broadened the company's portfolio and solidified its position as a leading player in the industry.

Collaborations:

Throughout his career, Li has worked closely with distinguished colleagues, notably Kunliang Zhang and Cheng Tzong Horng. These collaborations have been instrumental in accelerating progress in magnetic head device technology, leveraging the skills and expertise of these talented professionals to push the boundaries of innovation further.

Conclusion:

Min Li's innovative prowess, evident through his extensive patent portfolio, has firmly established him as a trailblazer in magnetic head device technology. His latest patents demonstrate a keen eye for critical dimension patterning and adaptive bias control, highlighting his ability to address significant industry challenges. With a remarkable career marked by collaborations with esteemed colleagues, Li's impact on the field of magnetic head technology is truly commendable.