The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2025
Filed:
Jun. 28, 2023
Headway Technologies, Inc., Milpitas, CA (US);
Tom Zhong, Saratoga, CA (US);
Hiroshi Omine, Santa Clara, CA (US);
Jianing Zhou, Fremont, CA (US);
Kunliang Zhang, Fremont, CA (US);
Ruhang Ding, Pleasanton, CA (US);
Min Li, Fremont, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
Systems and methods for controlling a critical dimension (CD) uniformity of a magnetic head device are described. A film stack that is part of a system for controlling a critical dimension (CD) uniformity of a magnetic head device can include a substrate, a magnetoresistive (MR) sensor layer, and a hard mask layer. The system can also include a first mask that defines critical shape patterns other than the CD. The hard mask layer can be patterned using the first mask. The system can also include a second mask that defines the CD. A mandrel pattern can be formed on the hard mask layer using the second mask.