The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 2023
Filed:
Jun. 30, 2021
Headway Technologies, Inc., Milpitas, CA (US);
Tom Zhong, Saratoga, CA (US);
Hiroshi Omine, Santa Clara, CA (US);
Jianing Zhou, Fremont, CA (US);
Kunliang Zhang, Fremont, CA (US);
Ruhang Ding, Pleasanton, CA (US);
Min Li, Fremont, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
Methods of critical dimension (CD) uniformity control for magnetic head devices are disclosed. In some embodiments, a method can include providing a film stack, the film stack including a substrate, a magnetoresistive (MR) sensor layer, and a hard mask layer, patterning the hard mask layer using a first mask that defines critical shape patterns other than the CD, forming a mandrel pattern using a second mask that defines the CD, and forming a sidewall spacer pattern on sidewalls of the mandrel pattern, and removing the mandrel pattern.