Tainan, Taiwan

Min-Hsiu Hung

USPTO Granted Patents = 26 

Average Co-Inventor Count = 6.4

ph-index = 3

Forward Citations = 32(Granted Patents)


Company Filing History:


Years Active: 2018-2025

where 'Filed Patents' based on already Granted Patents

26 patents (USPTO):

Title: Min-Hsiu Hung: Innovator in Semiconductor Technologies

Introduction

Min-Hsiu Hung is an accomplished inventor based in Tainan, Taiwan, with an impressive portfolio of 22 patents. His work focuses primarily on the field of semiconductor technologies, contributing to advancements that enhance the efficiency and effectiveness of electronic components.

Latest Patents

Among his latest patents, two notable inventions stand out. The first is a "Method of Fabricating Contact Structure," which outlines a procedure for creating a contact structure by forming an opening in a dielectric layer. A conductive material layer is formed within this opening, with a unique thickness variation that optimizes performance. The process involves a series of treatments to achieve a uniform thickness in the conductive material, ultimately improving the reliability of electronic connections.

The second patent, titled "Conductive Feature Formation and Structure," describes methods for forming various conductive features such as metal contacts and vias. This innovation involves forming a dielectric layer on a semiconductor substrate, establishing an opening to expose the source/drain region, and creating a silicide region to enhance conductivity. The use of Plasma-Enhanced Chemical Vapor Deposition (PECVD) in this process signifies a cutting-edge approach to semiconductor fabrication.

Career Highlights

Min-Hsiu Hung's career is notably tied to his role at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he applies his expertise to develop pioneering semiconductor solutions. His extensive experience in this industry has allowed him to contribute to numerous advancements that drive technology forward.

Collaborations

Throughout his career, Min-Hsiu has collaborated with esteemed colleagues such as Chih-Wei Chang and Huang-Yi Huang. Together, they work on innovative projects that push the boundaries of semiconductor technology, working as part of a talented team dedicated to excellence in manufacturing processes.

Conclusion

With a solid foundation in semiconductor technologies and a record of successful patents, Min-Hsiu Hung stands out as a significant figure in innovation. His work at Taiwan Semiconductor Manufacturing Company Limited reflects his dedication to advancing industry standards and shaping the future of electronics. As technologies evolve, Hung's contributions will undoubtedly play a critical role in the ongoing transformation within the semiconductor field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…