Menlo Park, CA, United States of America

Mehrdad Nikoonahad

This inventor holds 69 USPTO granted patents and 2 published patent applications and 3 EPO patents, primarily in Optical Metrology (CPC class G01N). Top assignees: Kla-Tencor Technologies Corporation, Kla Tencor Corporation, Tencor Instruments. Active years: 1996-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mehrdad Nikoonahad. Retrieved from https://idiyas.com/inventor/mehrdad-nikoonahad

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 69 

% Patents Active = 68.1


Average Co-Inventor Count = 3.5

ph-index = 34

Forward Citations = 3,193(Granted Patents)

Forward Citations (Not Self Cited) = 2,823(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Los Altos, CA (US) (2006)
  • Atherton, CA (US) (1998 - 2009)
  • Menlo Park, CA (US) (1996 - 2013)

Company Filing History:


Years Active: 1996-2013

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Areas of Expertise:
Optical Spectroscopy
Critical Dimension
Overlay Error
Thin Film Characterization
Defect Inspection
Scatterometric Measurements
Surface Inspection
Parametric Profiling
Etch Process
Radiation Pulses
Three-Dimensional Structures
Lithography
69 patents (USPTO):Explore Patents

Title: Mehrdad Nikoonahad: Innovating Semiconductor Fabrication Processes

Introduction:

Mehrdad Nikoonahad, a prolific inventor based in Menlo Park, CA, has made significant contributions to the field of semiconductor fabrication processes. With an impressive portfolio of 69 patents, Nikoonahad is known for his expertise in developing methods and systems for determining critical dimensions and overlay of specimens. His groundbreaking work has paved the way for advancements in optical and non-optical metrology techniques, benefiting the semiconductor industry as a whole.

Latest Patents:

Nikoonahad's recent patents revolve around methods and systems for monitoring semiconductor fabrication processes. In particular, these inventions focus on a measurement device comprising an illumination system, a detection system, and a stage that supports a specimen. This configuration allows the system to determine multiple properties of the specimen, such as critical dimension and overlay misregistration, defects and thin film characteristics, flatness, adhesion, and more. By enabling optical and non-optical metrology and inspection techniques, these patents provide valuable tools for quality control and process optimization.

Career Highlights:

Throughout his career, Nikoonahad has worked with reputable companies in the semiconductor industry, including KLA-Tencor Technologies Corporation and KLA-Tencor Corporation. At these organizations, he has been instrumental in driving innovation and developing cutting-edge technologies. His expertise in critical dimension measurement and overlay analysis has been highly valued, contributing to the advancement of semiconductor fabrication processes.

Collaborations:

Nikoonahad has had the privilege of working alongside esteemed colleagues, including Ady Levy and John Fielden. Collaborations with talented individuals like these have fostered a collaborative environment conducive to pushing the boundaries of innovation in the semiconductor industry. Together, they have brought forth significant advancements, contributing to enhanced precision, accuracy, and efficiency in semiconductor fabrication processes.

Conclusion:

Mehrdad Nikoonahad's exceptional contributions to the field of semiconductor fabrication processes have significantly impacted the industry. With a remarkable patent portfolio focusing on critical dimension determination, overlay analysis, and various other properties of specimens, Nikoonahad's inventions have opened new avenues for quality control and optimization. As he continues his work in the semiconductor industry, we can expect further breakthroughs that will shape the future of this vital technology sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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