The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2008
Filed:
Nov. 19, 2003
Mehrdad Nikoonahad, Menlo Park, CA (US);
Shing Lee, Fremont, CA (US);
Hidong Kwak, San Jose, CA (US);
Sergio Edelstein, Los Gatos, CA (US);
Guoheng Zhao, Milpitas, CA (US);
Gary Janik, Palo Alto, CA (US);
Mehrdad Nikoonahad, Menlo Park, CA (US);
Shing Lee, Fremont, CA (US);
Hidong Kwak, San Jose, CA (US);
Sergio Edelstein, Los Gatos, CA (US);
Guoheng Zhao, Milpitas, CA (US);
Gary Janik, Palo Alto, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
In an optical system measuring sample characteristics, by reducing the amount of ambient absorbing gas or gases and moisture present in at least a portion of the illumination and detection paths experienced by vacuum ultraviolet (VUV) radiation used in the measurement process, the attenuation of such wavelength components can be reduced. Such reduction can be accomplished by a process without requiring the evacuation of all gases and moisture from the measurement system. In one embodiment, the reduction can be accomplished by displacing at least some of the absorbing gas(es) and moisture present in at least a portion of the measuring paths so as to reduce the attenuation of VUV radiation. In this manner, the sample does not need to be placed in a vacuum, thereby enhancing system throughput.