Medhat A Toukhy

Title: Medhat A Toukhy: Innovator in Photoresist Technology

Introduction

Medhat A Toukhy is a prominent inventor based in Flemington, NJ (US). He has made significant contributions to the field of photoresist technology, holding a total of 11 patents. His work focuses on developing advanced materials that enhance the performance of photoresist compositions used in various manufacturing processes.

Latest Patents

Among his latest patents, Toukhy has developed a Novolak/DNQ based, chemically amplified photoresist. This invention relates to resist compositions that include a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), a base component, and a solvent component. The polymer component is a Novolak derivative, which comprises Novolak repeat units with free phenolic hydroxy moieties. Additionally, he has created a negative resist formulation for producing undercut pattern profiles, which is imageable by 365 nm radiation and developable in aqueous base.

Career Highlights

Throughout his career, Toukhy has worked with notable companies such as Merck Patent GmbH and Az Electronic Materials USA Corp. His experience in these organizations has allowed him to refine his expertise in photoresist technology and contribute to innovative solutions in the field.

Collaborations

Toukhy has collaborated with esteemed colleagues, including Weihong Liu and Ping-Hung Lu. These partnerships have further enriched his research and development efforts, leading to advancements in photoresist applications.

Conclusion

Medhat A Toukhy's contributions to photoresist technology demonstrate his commitment to innovation and excellence. His patents and collaborations reflect a deep understanding of the complexities involved in developing effective photoresist compositions.