The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2007
Filed:
Jul. 12, 2005
Medhat A. Toukhy, Flemington, NJ (US);
Ping-hung LU, Bridgewater, NJ (US);
Salem K. Mullen, Hackettstown, NJ (US);
Medhat A. Toukhy, Flemington, NJ (US);
Ping-Hung Lu, Bridgewater, NJ (US);
Salem K. Mullen, Hackettstown, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.