The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Nov. 12, 2020
Applicant:

Merck Patent Gmbh, Darmstadt, DE;

Inventors:

Weihong Liu, Branchburg, NJ (US);

Ping-Hung Lu, Bridgewater, NJ (US);

Chunwei Chen, Whitehouse Station, NJ (US);

Medhat A. Toukhy, Flemington, NJ (US);

Assignee:

Merck Patent GmbH, Darmstad, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/022 (2006.01); G03F 7/023 (2006.01); G03F 7/30 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); C08F 220/1804 (2020.02); C08F 220/1807 (2020.02); C08F 220/281 (2020.02); G03F 7/0226 (2013.01); G03F 7/30 (2013.01);
Abstract

Describe herein is a composition comprising: an acrylic polymer comprising repeat units selected from ones having structure (1), (2), (3), (4), (5), (6), and (7) wherein these repeat units are present in said acrylic polymer in the mole % ranges as described herein; a Novolak resin having a dissolution rate in 0.26 N aqueous TMAH of at least 50 Å/sec; a diazonaphthoquinone (DNQ) photoactive compound (PAC); and an organic spin casting solvent, and a process of using said composition as a positive photoresist developable in aqueous base.


Find Patent Forward Citations

Loading…